Description
The mission of Micro and Nanofabrication Unit (MNTEC) is to assist the production of materials and devices using micro and nanofabrication technologies. The MNTEC provides support for research, graduate and pos-graduate training and technological services to companies. The Cleanroom with an area of 200m2 consists of 2 lithography rooms (ISO 6) and 2 deposition rooms (ISO 7).
FACILITIES
Photolithography and direct laser writing:
Direct laser writer uPG101, Heidelberg;
Mask aligner MJB, Karl Suss;
Spinner PWM32-PS-R790, Headway Resarch Inc;
Techniques for thin film deposition and processing:
Ion beam sputtering and milling, Commonwealth Scientific Corporation;
Two e-beam evaporators, Auto 306, Edwards;
PECVD PlasmaLab 80Plus, Oxford Instruments;
Sputtering;
MThermal evaporator, Edwards;
RIE PlasmaLab 80Plus, Oxford Instruments;
Technical facilities for sample cutting and preparation:
Wire Bonder, Kulicke and Soffa;
Disc saw, Disco DAD3220;
Accessory equipment (furnaces, hot-plates, ultra-sound baths, etc.);
Equipments for analysis and measurement:
Optical microscopes, Leica, Zeiss;
Profilometer Dektak XT, Bruker.
